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1 photoresist lift-off
відшаровування шару фоторезистаEnglish-Ukrainian dictionary of microelectronics > photoresist lift-off
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2 photoresist lift-off technique
метод зворотної фотолітографіїEnglish-Ukrainian dictionary of microelectronics > photoresist lift-off technique
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3 lift-off
1) зворотна [вибухова] літографія 2) відшаровування; відривши - metal lift-off
- photoresist lift-off
- T-gate lift-off -
4 technique
1) метод, спосіб (див. т-ж арproach, method) 2) технологія (див. т-ж technology) - alloying technique
- annular sawing technique
- assembly technique
- automatic layout technique
- automatic test generation technique
- BIMOS technique
- bond etchback technique
- boron etch stop technique
- bump-metallization technique
- CAD technique
- GDI technique
- chip floorplan technique
- chip processing technique
- circuit technique
- CMOS technique
- cold-crucible technique
- cold-processing technique
- collector-diffusion isolation technique
- commutating auto-zeroing technique
- computerized design technique
- CVD technique
- decomposition technique
- definition technique
- development advanced rate technique
- diffused planar technique
- diffusion technique
- double-diffusion technique
- dry processing technique
- electrochemical passivation technique
- electron-beam technique
- electroplating technique
- etch-and-refill technique
- etchback technique
- etch-stop technique
- evaporation technique
- fabrication technique
- film technique
- flip-chip technique
- floating crucible technique
- folding technique
- four-point probe technique
- growth technique
- implant-isolation technique
- incremental time technique
- integrated technique
- interconnection technique
- internal trace technique
- ion-implantation technique
- isolation technique
- laser selective photoionisation technique
- laser-trimming technique
- lifting technique
- lift-off technique
- light-scattering technique
- liquid encapsulation Czochralski technique
- liquid-phase epitaxy technique
- liquid epitaxy technique
- lithographic technique
- masked diffusion technique
- masking technique
- mask-making technique
- masterslice technique
- mesa-fabrication technique
- Minimod technique
- mixed-level technique
- mixed-mode technique
- modified horizontal Bridgman technique
- modified Bridgman technique
- molecular-beam epitaxy technique
- monolithic technique
- mounting technique
- multichip assembly technique
- multiwire technique
- native охide technique
- node tearing technique
- n-type doping technique
- open-tube diffusion technique
- open-tube technique
- optical alignment technique
- oxide masking technique
- oxygen-plasma охidation technique
- packaging technique
- peripheral sawing technique
- photolithographic technique
- photomasking technique
- photomechanical technique
- photoresist lift-off technique
- piecewise linear modeling technique
- planar-epitaxial technique
- plasma-охidation technique
- plasma-spraying technique
- p-n junction isolation technique
- positive photoresist masking technique
- probe technique
- processing technique
- production technique
- production soldering technique
- reduction technique
- resist technique
- SBC technique
- scaling technique
- screen-printing technique
- screen-stencil technique
- self-aligned double-diffusion technique
- serial-writing technique
- shallow V-groove technique
- shrinking technique
- silk-screeningtechnique
- silk-screentechnique
- single-layer interconnection technique
- single-level interconnection technique
- sinking technique
- slice technique
- solder reflow technique
- solute-diffusion technique
- SOS isolation technique
- sparse matrix technique
- staged-diffusion technique
- staining technique
- stencil technique
- step-and-repeat reduction technique
- tape-carrier technique
- test technique
- thermal wave technique
- trench-etch technique
- tri-mask technique
- trimming technique
- two-layer resist technique
- two-phase technique
- two-step technique
- vapor-oxidation technique
- vapor-phase epitaxial technique
- V-ATC technique
- wet technique
- wire-bonding technique
- wire-wrapping technique
- wire-wrap technique
- wiring technique
- 1:1 photomasking techniqueEnglish-Ukrainian dictionary of microelectronics > technique
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5 etching
травлення (див. т-ж etch) - anisotropic etching
- anode etching
- batch etching
- blanket etching
- chemically assisted etching
- concentration dependent etching
- crystallographically sensitive etching
- deep reactive ion etching DRIE
- deep reactive ion etching
- differential etching
- digital etching
- diode ion etching
- diode etching
- dip etching
- directional etching
- dislocation etching
- dry process etching
- dry etching
- electron-beam induced etching
- excessive etching
- exciraer laser etching
- gas-phase plasma-assisted etching
- high-frequency ion etching
- hydrogen reactive ion etching
- ion etching
- ion-assisted plasma etching
- ion-beam induced etching
- isotropic etching
- jet etching
- laser-enhanced etching
- laser-induced pattern projection etching
- laser radical etching
- lateral etching
- lift-off etching
- light-induced etching
- low-pressure plasma etching
- low-pressure etching
- masked etching
- maskless etching
- maskless laser etching
- mesa etching
- microwave plasma etching
- microwave etching
- mild etching
- nonundercutting etching
- orientation-dependent etching
- oxygen gas plasma etching
- permeation etching
- photochemical etching
- photoelectrochemical etching
- photo-enhanced chemical dry etching
- photoexcited etching
- photo-initiated etching
- photoresist-masked etching
- plasma reactor etching
- plasma etching
- post etching
- preferential etching
- radical plasma etching
- radical etching
- radio-frequency plasma etching
- reactive ion etching
- regenerative etching
- resistless etching
- selective etching
- sharp etching
- sideways etching
- single-step laser etching
- spray etching
- sputter etching
- steady-state etching
- synchrotron radiation-assisted etching
- taper etching
- tetrode ion etching
- tetrode etching
- triode ion etching
- triode etching
- undercuttingetching
- undercutetching
- UV laser etching
- vacuum ultraviolet-assisted etching
- vertical etching
- VUV-assisted etching
- wet chemical etching
- wet etching
- zero-undercut etching
См. также в других словарях:
photoresist lift-off — fotorezisto sluoksnio atlipimas statusas T sritis radioelektronika atitikmenys: angl. photoresist lift off vok. Abheben der Fotoresistschicht, n rus. отслаивание слоя фоторезиста, n pranc. détachement de la couche du photorésist, m … Radioelektronikos terminų žodynas
Lift-off (microtechnology) — Lift off process in microstructuring technology is a method of creating structures (patterning) of a target material on the surface of a substrate (ex. wafer) using a sacrificial material.It is an additive technique as opposed to more traditional … Wikipedia
détachement de la couche du photorésist — fotorezisto sluoksnio atlipimas statusas T sritis radioelektronika atitikmenys: angl. photoresist lift off vok. Abheben der Fotoresistschicht, n rus. отслаивание слоя фоторезиста, n pranc. détachement de la couche du photorésist, m … Radioelektronikos terminų žodynas
Abheben der Fotoresistschicht — fotorezisto sluoksnio atlipimas statusas T sritis radioelektronika atitikmenys: angl. photoresist lift off vok. Abheben der Fotoresistschicht, n rus. отслаивание слоя фоторезиста, n pranc. détachement de la couche du photorésist, m … Radioelektronikos terminų žodynas
fotorezisto sluoksnio atlipimas — statusas T sritis radioelektronika atitikmenys: angl. photoresist lift off vok. Abheben der Fotoresistschicht, n rus. отслаивание слоя фоторезиста, n pranc. détachement de la couche du photorésist, m … Radioelektronikos terminų žodynas
отслаивание слоя фоторезиста — fotorezisto sluoksnio atlipimas statusas T sritis radioelektronika atitikmenys: angl. photoresist lift off vok. Abheben der Fotoresistschicht, n rus. отслаивание слоя фоторезиста, n pranc. détachement de la couche du photorésist, m … Radioelektronikos terminų žodynas
Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… … Wikipedia
Resist — is also an album by Kosheen and a song by Rush. In semiconductor fabrication, resist refers to both: # A thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via… … Wikipedia
Ohmic contact — An ohmic contact is a region on a semiconductor device that has been prepared so that the current voltage (I V) curve of the device is linear and symmetric. If the I V characteristic is non linear and asymmetric, the contact is not ohmic, but is… … Wikipedia
Elektronenstrahllithografie — Die Elektronenstrahllithografie (ESL, englisch electron beam lithography oft als e beam lithography abgekürzt) ist in der Mikro und Halbleitertechnik ein spezielles Verfahren zur Strukturierung einer Elektronenstrahl empfindlichen Schicht… … Deutsch Wikipedia
